Detail specification for pulse magnetron of type ckm - 6951
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Detail specification for pulsed magnetrons of type ckm - 29 series
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Detail specification for frequency agility pulsed magnetron of type ckm - 709 709a
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Blank detail specification : pulsed magnetrons excluding frequency agile magnetrons ; german version en 136001 : 1992
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Specification for harmonized system of quality assessment for electronic components - blank detail specification : pulsed magnetrons excluding frequency agile magnetrons
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In the work , mid - frequency pulse magnetron sputtering is used to prepare znoral thin films used as the back reflector of the thin silicon films solar cells . the best techological condition was obtained by optimizing the preparing conditions , ( var is decided by the deposition rate , target voltage : 265v , gas pressure : 0 . 6pa , the high base vacuum is expected
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