In outside vapor deposition or vapor axial deposition, the glass is formed by " flame hydrolysis ", a reaction in which silicon tetrachloride and germanium tetrachloride are oxidized by reaction with water ( H 2 O ) in an oxyhydrogen flame.
22.
An alternative industrial process for the preparation of very high purity silane, suitable for use in the production of semiconductor grade silicon, starts with metallurgical grade silicon, hydrogen, and silicon tetrachloride and involves a complex series of redistribution reactions ( producing byproducts that are recycled in the process ) and distillations.
23.
The reaction of silicon tetrachloride with an excess of sodium azide at room temperature in acetonitrile will result in the formation of sodium hexaazidosilicide which by adding ligands such as 2, 22-bipyridine and 1, 10-phenanthroline will result in stable silicon tetraazide adducts Other bases such as pyridine and tetramethylethylenediamine will not react with the hexaazido silicide ion.
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