The dependence of contact resistance on the details of the interfacial chemistry is what makes the reproducible fabrication of ohmic contacts such a manufacturing challenge.
42.
The contact resistance is not stable immediately after contact closure, and drifts, mostly downwards, for several seconds after closure, the change perhaps being 0.5 ohm.
43.
The difference between resistance derived from two-lead and four-lead methods is a reasonably accurate measurement of contact resistance assuming that the leads resistance is much smaller.
44.
This is low enough that it may be used with safe low voltages, yet high enough that the currents remain low, avoiding problems with contact resistance.
45.
With this type of meter, any voltage drop due to the resistance of the first pair of leads and their contact resistances is ignored by the meter.
46.
The approximations used here ( linear potential drop across the channel region, constant contact resistance, . . . ) lead sometimes to the channel dependent contact resistance.
47.
For this, vias comprising tightly packed ( > 10 13 cm " 2 ) metallic CNTs with low defect density and low contact resistance are needed.
48.
The approximations used here ( linear potential drop across the channel region, constant contact resistance, . . . ) lead sometimes to the channel dependent contact resistance.
49.
However, ohmic contact resistance heating is generated when peak current flows through these individual microscopic contacting points, which are critical areas for the overall internal resistance of the capacitor.
50.
This may be due to dirt or corrosion and is typically perceived as " crackling " as the contact resistance fluctuates; this is especially noticed as the device is adjusted.
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